Spectral Film Thickness Monitors -OTSUKA ELECTRONICS CO.,LTD.

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We offer various systems according to customer needs, from standard systems for R&D to custom-made systems that precisely meets customer requirement, including a line transport system for manufacturing equipment, robots, inspection systems, and jigs.

Spectral Ellipsometer
FE-5000

Reflective Film Thickness Monitor
FE-3000

Film Thickness Evaluation System
MCPD series
(Fiber type)

Desk-top type Spectral Ellipsometer
FE-5000S

Film-Thickness Measurement System for FPD FE series

Film-Thickness Measurement System for FPD
FE seires

Film-Thickness Measurement System for Semiconductors
FE series

In-Line Film-Thickness Measurement System
MCPD series

　　　 Spectral Ellipsometer FE-5000 / FE-5000S

　　　 Reflective Film Thickness Monitor FE-3000

　　　 Film Thickness Evaluation System MCPD series

Spectral Ellipsometer FE-5000

Optimal for film-thickness and quality control of multilayer films and for optical-constant analysis (n: refractive index; k: extinction coefficient)

Measurable Range	0.1nm ~ 1000nm
Wavelength Range	250nm ~ 1100nm

Desk-top type Spectral Ellipsometer FE-5000S

Newly released low-priced spectral ellipsometer supports high-precision film-thickness analysis and optical-constant analysis. Despite its price, the FE-5000S provides automatic angle variable measurement and all-angle simultaneous analysis

Measurable Range	0.1nm ~ 1000nm
Wavelength Range	300nm ~ 800nm

Reflective Film Thickness Monitor FE-3000

Supports a wide measurement range regardless of its thickness, offering approaches for a diverse range of film types through various functions including multilayer film analysis and microspot measurement

Measurable Range	1nm ~ 250µm
Wavelength Range	190nm ~ 1600nm

Film Thickness Evaluation System MCPD series

Provides flexible optical system arrangement based on optical fibers and supports in-process measurement.

Measurable Range	800nm ~ 250µm
Wavelength Range	220nm ~ 1600nm

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Film-Thickness Measurement System for FPD FE series

Supports various present and next-generation glass substrate sizes

(Usage)
LCD	ITO/Glass,PI/OC/Glass,CF/Glass,Resist/Glass
TFT	SiN/a-Si/Glass
Organic EL	Organic EL/ITO/Glass
PDP	Ferroelectric layer /Glass

Film-Thickness Measurement System for Semiconductors FE series

Supports f300-mm diameter wafers with fully automated transport specification

(Usage)
·Si Wafer	SiO2/Si,Resist/Si,SiO2/a-Si,SiO2/SiN/SiO2

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In-Line Film-Thickness Measurement System: MCPD series (conveyor/film line system)

Optimal for film manufacturing lines and for remote, multipoint measurement

(1) Microscope head (2) X-Y stage

【 Microscope head attachment type 】
Optimal for thin-film measurement (up to 1.0 μm)
Implementation of high-precision absolute-reflectance and film-thickness measurement for microscopic systems

(1) MCPDdetector main body　
(2) Branched Y-shaped fiber
(3) Light source 　
(4) Traverse unit
(5) Fiber holder

【 Traverse type 】
Optimal for thick-film measurement (0.8 um and greater)
Supports traverse type and mapping measurement based on multiple branching fibers

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